Semiconductor processing apparatus and dielectric window cleaning method of semiconductor processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12257608
APP PUB NO 20230032679A1
SERIAL NO

17788650

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Abstract

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Embodiments of the present disclosure provide a semiconductor processing apparatus and a dielectric window cleaning method of the semiconductor processing apparatus. The semiconductor apparatus includes a reaction chamber and a dielectric window arranged in the reaction chamber, an induction coil and a cleaning electrode, both located above the dielectric window, a radio frequency (RF) source assembly configured to apply RF power to the induction coil and the cleaning electrode, an impedance adjustment assembly electrically being connected to the cleaning electrode and being in an on-off connection to the output terminal of the RF source assembly. The semiconductor processing apparatus and the dielectric window cleaning method of the semiconductor processing apparatus of embodiments of the present disclosure can achieve a physical cleaning effect and a chemical cleaning effect at simultaneously on a basis of performing cleaning on the dielectric window. Thus, the cleaning efficiency of the dielectric window is effectively improved.

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Patent Owner(s)

Patent OwnerAddress
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTDBEIJING 100176

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Liu, Chunming Beijing, CN 47 291

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