Method for manufacturing mirror device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12264065
APP PUB NO 20240092634A1
SERIAL NO

17766770

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Abstract

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A method for manufacturing a mirror device, the method includes a first step of preparing a wafer having a support layer, a device layer, and an intermediate layer; a second step of forming a slit in the wafer such that the movable portion becomes movable with respect to the base portion by removing a part of each of the support layer, the device layer, and the intermediate layer from the wafer and forming a plurality of parts each corresponding to the structure in the wafer, after the first step; a third step of performing wet cleaning using a cleaning liquid after the second step; and a fourth step of cutting out each of the plurality of parts from the wafer after the third step. In the second step, a part of the intermediate layer is removed from the wafer by anisotropic etching.

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Patent Owner(s)

Patent OwnerAddress
HAMAMATSU PHOTONICS K KHAMAMATSU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ide, Tomoyuki Hamamatsu, JP 23 12
Matsumoto, Takahiro Hamamatsu, JP 196 1869
Suzuki, Daiki Hamamatsu, JP 87 119
Takahashi, Mikito Hamamatsu, JP 6 0

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