Energy filter for use in the implantation of ions into a substrate

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12266499
APP PUB NO 20220181114A1
SERIAL NO

17631186

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Abstract

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The energy filter for use in the implantation of ions into a substrate is micropatterned for establishing, in the substrate, a dopant depth profile and/or defect depth profile brought about by the implantation, and has two or more layers or layer sections which are arranged one after another in the height direction of the energy filter. The energy filter also has a plurality of cavities each of which arranged between at least two layers or layer sections, with interior walls bounding the cavities and joining the at least two layers or layer sections to one another.

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Patent Owner(s)

Patent OwnerAddress
MI2-FACTORY GMBHMORITZ-VON-ROHR-STR 1A 07745 JENA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Csato, Constantin Stammbach, DE 20 10
Krippendorf, Florian Jena, DE 20 10

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