Capacitor structure and method of manufacturing same, and memory

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 12266683
APP PUB NO 20220037459A1
SERIAL NO

17401502

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Abstract

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A capacitor structure and a method of manufacturing the same, and a memory are provided. The method includes the following operations. A substrate is provided. A first conductive structure with a shape of column is formed on the substrate. A second conductive structure is formed on the substrate. The second conductive structure surrounds the first conductive structure and is spaced with the first conductive structure. The first conductive structure and the second conductive structure together form a bottom electrode. A capacitor dielectric layer is formed. The capacitor dielectric layer covers the surface of the substrate and the surface of the bottom electrode. A top electrode covering the surface of the capacitor dielectric layer is formed.

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Patent Owner(s)

Patent OwnerAddress
CHANGXIN MEMORY TECHNOLOGIES INCHEFEI CITY ANHUI 230601

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lu, Yong Hefei, CN 285 2413
Shen, Hongkun Hefei, CN 5 0
Wu, Gongyi Hefei, CN 26 8

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