Gas treatment apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 9, 2003
Grant Date -
Apr 12, 2001
app pub date -
Dec 14, 2000
filing date -
Jan 7, 1998
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A gas flow regulating surface portion 37a is the farthest from the front surface of a wafer W in the middle between a peripheral portion of the wafer W and a center portion of a sealing vessel. The gas flow regulating portion 37a protrudes to the front surface of the wafer W in the vicinity of a center portion that surrounds an exhausting opening 35a. In other words, a convex portion 37c is formed in a peripheral area of the gas flow regulating surface portion 37a that surrounds the exhausting opening 35a. Since treatment gas flows along the front surface of the gas flow regulating portion 37a, treatment gas equally contacts the wafer W in the radius direction of the wafer W. Thus, a film with equal thickness is formed.
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