Apparatus for eliminating impurities by ozone generated in space above substrate surface and film forming method and system therewith
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United States of America Patent
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Oct 15, 2002
Issued Date -
N/A
app pub date -
Dec 22, 2000
filing date -
Sep 8, 1997
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Abstract
In this impurity eliminating apparatus, a mounting stand on which a wafer is mounted and a casing which confronts the mounting stand are provided in a container. A lower face of the casing consists of quartz glass. Inside the casing, an irradiating body for irradiating ultraviolet rays toward the wafer on the mounting stand is provided. The casing is full of inactive gas atmosphere supplied from an inactive gas supply pipe. The atmosphere above the wafer is exhausted from one side by an exhauster. Following the treatment by the impurity eliminating apparatus with the above structure, coating treatment with a treatment solution for forming a SOG film is performed. Thus, organic substances on the surface of the wafer is eliminated to form the SOG film.
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