Silica glass having superior durability against excimer laser beams and method for manufacturing the same
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United States of America Patent
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Jan 15, 2002
Grant Date -
Apr 26, 2001
app pub date -
Dec 15, 2000
filing date -
Dec 8, 1997
priority date (Note) -
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Abstract
A silica glass is provided for use in an optical system processing an excimer laser beam. The silica glass has a molecular hydrogen concentration of about 5.times.10.sup.18 molecules/cm.sup.3 or less and is substantially free from defects which become precursors susceptible to an one-photon absorption process and a two-photon absorption process upon irradiation of the excimer laser beam to the silica glass.
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