Scanning exposure method with reduced time between scans

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United States of America Patent

PATENT NO 6686990
SERIAL NO

09725912

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A positioning method in which a system performs operations relative to areas on a substrate by a series of relative movements between the system and substrate scanning exposures. The method includes the steps of disposing a first area relative to a system performing an operation relative to the first area, and moving the substrate from a first position where the first operation relative to the first area has finished to a second position where a second operation relative to a second area is to start, and synchronously moving the system from a third position where the first operation relative to the first area has finished to a fourth position where the second operation relative to the second area is to start. An acceleration of the substrate during movement from the first position to the second position and an acceleration of the system during movement from the third position to the fourth position continually have absolute values greater than zero.

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Patent Owner(s)

  • NIKON CORPORATION

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hazelton, Andrew J San Carlos, CA 139 2837
Yuan, Bausan San Jose, CA 61 663

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