Apparatus for enhancing image contrast using intensity filtration
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United States of America Patent
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Aug 7, 2001
Grant Date -
May 10, 2001
app pub date -
Dec 15, 2000
filing date -
Jun 29, 1998
priority date (Note) -
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Abstract
A photolithography apparatus for deep UV enhances contrast and also therefore increases the resolution of patterned images by passing only intensities that fall within a specific minimum threshold value, resulting in a more exact aerial image replicating the mask image. this photolithography apparatus employs a different approach to contrast enhancement which is distinguished from previous methods by eliminating the need for an extra layer of contrast enhancement on top of the resist, thereby reducing the number of processing steps in semiconductor fabrication.
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