Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus
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United States of America Patent
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-
Dec 30, 2003
Grant Date -
May 17, 2001
app pub date -
Dec 12, 2000
filing date -
Sep 29, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
An illuminator for controlling a beam of radiation for a lithographic projection apparatus includes a plurality of optical elements and an exchanger for inserting and removing the optical elements from the beam path. The intensity distribution of the beam at a pupil plane of the illuminator is determined by the optical elements. Different illumination settings (intensity distributions) can be obtained by the exchanger swapping between different optical elements, without the need for a zoom-axicon module.
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