US Patent Application No: 2001/0001,645

Number of patents in Portfolio can not be more than 2000

WASTE GAS TREATMENT SYSTEM OF A SEMICONDUCTOR DEVICE FABRICATION FACILITY AND HAVING WET AND DRY TREATMENT UNITS INTEGRATED BY A GAS SEPARATION UNIT

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Abstract

A waste gas treatment system treats waste gases of the type produced during the manufacture of semiconductor devices and therefore having different chemical characteristics. Based on the size of the particles of the waste gases, a gas separation unit discriminates waste gas that is best-suited for wet treatment from waste gas best-suited for dry treatment. A wet treatment unit is connected to one outlet of the gas separation unit, and a dry treatment unit is connected to another outlet of the gas separation unit. On the other hand, both the wet treatment unit and the dry treatment unit are connected to a water spray unit. The water spray unit treats the waste gases, which have passed through either the wet treatment unit or the dry treatment unit, so as to treat the waste gas for untreated water-soluble components.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SAMSUNG ELECTRONICS CO., LTD.SUWON-SI GYEONGGI-DO45485

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Jin-Hee Daejeon, KR 30 57
Lee, Sung-Jae Anyang, KR 15 76
YI, SOK-HO KYUNGKI-DO, KR 3 9

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AMERICAN AIR LIQUIDE, INC. (1)
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