US Patent Application No: 2001/0001,652

Number of patents in Portfolio can not be more than 2000

PROCESS FOR TREATING FLOURINE COMPOUND-CONTAINING GAS

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Abstract

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A gas stream containing at least one fluorine compound selected from the group consisting of compounds of carbon and fluorine, compounds of carbon, hydrogen and fluorine, compounds of sulfur and fluorine, compounds of nitrogen and fluorine and compounds of carbon, hydrogen, oxygen and fluorine is contacted with a catalyst comprising at least one of alumina, titania, zirconia and silica, preferably a catalyst comprising alumina and at least one of nickel oxide, zinc oxide and titania in the presence of steam, thereby hydrolyzing the fluorine compound at a relatively low temperature, e.g. 200.degree.-800.degree. C., to convert the fluorine of the fluorine compound to hydrogen fluoride.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
HITACHI, LTD.TOKYO31401
SHUICHI KANNOCHIYODA-KU TOKYO0

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arato, Toshiaki Hitachinaka, JP 18 105
Azuhata, Shigeru Hitachi, JP 50 657
Ikeda, Shinzo Naka-gun, JP 13 82
Irie, Kazuyoshi Hitachi, JP 22 36
Kanno, Shuichi Hitachi, JP 40 89
Tamata, Shin Higashiibaraki-gun, JP 61 218
Yamashita, Hisao Hitachi, JP 59 502
Yasuda, Takeshi Aichi pref., JP 54 218

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
APPLIED MATERIALS, INC. (5)
6,905,663 Apparatus and process for the abatement of semiconductor manufacturing effluents containing fluorine gas 3 2000
7,736,599 Reactor design to reduce particle deposition during process abatement 1 2004
7,736,600 Apparatus for manufacturing a process abatement reactor 0 2006
7,700,049 Methods and apparatus for sensing characteristics of the contents of a process abatement reactor 2 2006
7,985,379 Reactor design to reduce particle deposition during process abatement 2 2007
 
HITACHI, LTD. (4)
7,308,409 Process for treating perfluorides 0 2002
7,128,882 Method and apparatus for treating perfluorocompounds 0 2002
7,666,365 Perfluoride processing apparatus 0 2005
7,658,890 Perfluoride processing apparatus 0 2005
 
EBARA CORPORATION (3)
6,949,225 Method and apparatus for treating a waste gas containing fluorine-containing compounds 3 2000
6,602,480 Method for treating waste gas containing fluorochemical 10 2001
7,972,582 Method and apparatus for treating exhaust gas 0 2002
 
MIDWEST REFRIGERANTS, LLC (2)
8,128,902 Method for the synthesis of anhydrous hydrogen halide and anhydrous carbon dioxide 0 2011
8,043,574 Apparatus for the synthesis of anhydrous hydrogen halide and anhydrous carbon dioxide 0 2011
 
BHT SERVICES PTE. LTD. (1)
7,569,193 Apparatus and method for controlled combustion of gaseous pollutants 1 2003
 
EDWARDS LIMITED (1)
7,824,637 Apparatus for treating a gas stream 0 2006
 
INEOS FLUOR HOLDINGS LIMITED (1)
6,921,519 Decomposition of fluorine containing compounds 2 2002
 
Kotusa, Inc. (1)
7,005,247 Controlled selectivity etch for use with optical component fabrication 1 2003
 
SHOWA DENKO K.K. (1)
8,231,851 Method for processing perfluorocarbon, and apparatus therefor 1 2002

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