PROCESS FOR TREATING FLOURINE COMPOUND-CONTAINING GAS

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United States of America Patent

APP PUB NO 20010001652A1
SERIAL NO

09005006

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Abstract

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A gas stream containing at least one fluorine compound selected from the group consisting of compounds of carbon and fluorine, compounds of carbon, hydrogen and fluorine, compounds of sulfur and fluorine, compounds of nitrogen and fluorine and compounds of carbon, hydrogen, oxygen and fluorine is contacted with a catalyst comprising at least one of alumina, titania, zirconia and silica, preferably a catalyst comprising alumina and at least one of nickel oxide, zinc oxide and titania in the presence of steam, thereby hydrolyzing the fluorine compound at a relatively low temperature, e.g. 200.degree.-800.degree. C., to convert the fluorine of the fluorine compound to hydrogen fluoride.

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Patent Owner(s)

Patent OwnerAddress
HITACHI LTD6-6 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 1008280 ?1008280

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ARATO, TOSHIAKI HITACHINAKA-SHI, JP 16 149
AZUHATA, SHIGERU HITACHI-SHI, JP 47 959
IKEDA, SHINZO IBARAKI-KEN, JP 12 128
IRIE, KAZUYOSHI HITACHI-SHI, JP 16 82
KANNO, SHUICHI HITACHI-SHI, JP 33 180
TAMATA, SHIN IBARAKI-KEN, JP 50 323
YAMASHITA, HISAO HITACHI-SHI, JP 54 667
YASUDA, TAKESHI TOKYO, JP 66 456

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