PROCESS FOR PREPARING PHOSPHOR PATTERN FOR FIELD EMISSION DISPLAY PANEL, PHOTOSENSITIVE ELEMENT FOR FIELD EMISSION DISPLAY PANEL, PHOSPHOR PATTERN FOR FIELD EMISSION DISPLAY PANEL AND FIELD DISPLAY PANEL
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United States of America Patent
Stats
-
May 21, 2002
Grant Date -
May 24, 2001
app pub date -
May 22, 1998
filing date -
May 22, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A phosphor pattern for a field emission display panel (FED) is provided. The phosphor pattern is formed by a process whichh comprises the steps of: (I) forming (A) a photosensitive resin composition layer containing a phosphor on a substrate to which a conductive layer is formed; (II) selectively irradiating active light to (A) the photosensitive resin composition layer containing a phosphor, for forming a pattern; (III) selectively removing (A) the photosensitive resin composition layer to which active light has been selectively irradiated by development, to form the pattern; and (IV) calcining the pattern to remove an unnecessary portion, to form the phosphor pattern. Also provided ar this process for forming the phosphor pattern, a photosensitive element for a FED and a field emission display panel. In forming the layer on the substrate, the photosensitive resin composition layer can be provided as a layer of a photosensitive element, and the element provided on the substrate such that the layer contacts the substrate.
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