Over-coating composition for photoresist, and processes for forming photoresist patterns using the same

United States of America Patent

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Jul 20, 2004
Grant Date
Jun 7, 2001
app pub date
Dec 1, 2000
filing date
Dec 2, 1999

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Expired

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Abstract

The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.

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Patent Owner(s)

Patent Owner	Address
HYUNDAI ELECTRONICS INDUSTRIES CO LTD	GYEONGGI DO SOUTH KOREA GYEONGGI-DO

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Baik, Ki Ho	Kyoungki-do, KR	87	3056
Jung, Jae Chang	Kyoungki-do, KR	173	5411
Kim, Jin Soo	Taejeon-shi, KR	181	1764
Koh, Cha Won	Seoul, KR	28	102
Kong, Keun Kyu	Kyoungki-do, KR	34	1001

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Over-coating composition for photoresist, and processes for forming photoresist patterns using the same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09728535

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PATENT NO	6764806
APP PUB NO	20010003030A1
SERIAL NO	09728535
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
July 20, 2004	US,6764806,B2 US6764806B2	GRANTED PATENT AS SECOND PUBLICATION
June 07, 2001	US,20010003030,A1 US20010003030A1	FIRST PUBLISHED PATENT APPLICATION

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09728535

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