Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 20010003271
APP PUB NO 20010003271A1
SERIAL NO

09731722

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A processing apparatus of the present invention has a mounted chamber holding a semiconductor wafer and having members for work-processing the substrate under any of heating, plasma and process gas or a combination of them, in which a film of Al.sub.2O.sub.3 and Y.sub.2O.sub.3 is formed on an inner wall surface of the chamber and on those exposed surface of the members within the chamber and has a high-corrosion resistance and insulating property and, when the process gas is introduced onto a processing surface of a semiconductor wafer and diffused into it, any product is less liable to be deposited on a plasma generation area and on those members held within the chamber.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
TOKYO ELECTRON LIMITEDTOKYO5246

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Otsuki, Hayashi Nirasaki-shi, JP 32 485

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Patent Info (Count) # Cites Year
 
Other [Check patent profile for assignment information] (1)
* 2003/0200,929 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film 48 2003
 
CYPRESS SEMICONDUCTOR CORPORATION (1)
* 2005/0227,382 In-situ surface treatment for memory cell formation 54 2004
 
ASM TECHNOLOGY SINGAPORE PTE LTD (2)
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* 2013/0333,620 FEED-THROUGH APPARATUS FOR A CHEMICAL VAPOUR DEPOSITION DEVICE 0 2012
 
LAM RESEARCH CORPORATION (24)
7128804 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof 0 2000
7311797 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor 27 2002
* 2004/0002,221 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor 2 2002
* 2004/0224,128 Low contamination plasma chamber components and methods for making the same 7 2004
7300537 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor 24 2004
* 2005/0150,866 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor 5 2004
* 7611640 Minimizing arcing in a plasma processing chamber 1 2006
7605086 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof 3 2006
8097105 Extending lifetime of yttrium oxide as a plasma chamber material 1 2007
* 2008/0169,588 Extending lifetime of yttrium oxide as a plasma chamber material 5 2007
8486841 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof 0 2009
* 2010/0003,826 CORROSION RESISTANT COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT AND METHOD OF MANUFACTURE THEREOF 1 2009
9190289 System, method and apparatus for plasma etch having independent control of ion generation and dissociation of process gas 0 2010
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9449793 Systems, methods and apparatus for choked flow element extraction 0 2010
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8999104 Systems, methods and apparatus for separate plasma source control 0 2010
* 2012/0034,394 DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS 0 2010
9111729 Small plasma chamber systems and methods 0 2010
* 2011/0132,874 SMALL PLASMA CHAMBER SYSTEMS AND METHODS 7 2010
* 9336996 Plasma processing systems including side coils and methods related to the plasma processing systems 0 2011
* 2012/0217,222 PLASMA PROCESSING SYSTEMS INCLUDING SIDE COILS AND METHODS RELATED TO THE PLASMA PROCESSING SYSTEMS 0 2011
9177762 System, method and apparatus of a wedge-shaped parallel plate plasma reactor for substrate processing 0 2011
8585844 Extending lifetime of yttrium oxide as a plasma chamber material 0 2011
 
PANASONIC CORPORATION (1)
* 2009/0130,335 PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, DIELECTRIC WINDOW USED THEREIN, AND MANUFACTURING METHOD OF SUCH A DIELECTRIC WINDOW 5 2006
 
SAINT-GOBAIN CERAMICS & PLASTICS, INC. (1)
6884514 Method for forming ceramic layer having garnet crystal structure phase and article made thereby 3 2002
 
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8277561 Chemical vapor deposition apparatus 3 2008
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Tosoh Corporation (1)
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HITACHI, LTD. (1)
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Jusung Engineering Co., Ltd. (2)
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KYOCERA CORPORATION (4)
7384696 Corrosion resistant member and method for manufacturing the same 1 2005
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7569280 Corrosion resistant member and method for manufacturing the same 0 2008
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HITACHI HIGH-TECHNOLOGIES CORPORATION (1)
* 2007/0215,278 Plasma etching apparatus and method for forming inner wall of plasma processing chamber 4 2006
 
HOME ROUND PAPER CO., LTD. (1)
* 7364798 Internal member for plasma-treating vessel and method of producing the same 14 2005
 
SHIMADZU CORPORATION (1)
* 2011/0000,529 Cathode Electrode for Plasma CVD and Plasma CVD Apparatus 0 2008
 
FUJIMI INCORPORATED (4)
7842383 Yttrium-aluminum double oxide thermal spraying powder 0 2005
* 2006/0116,274 Thermal spraying powder, thermal spraying method, and method for forming thermal spray coating 3 2005
7279221 Thermal spraying powder 3 2006
* 2006/0182,969 Thermal spraying powder 0 2006
 
COORSTEK, INC. (4)
* 7329467 Ceramic article having corrosion-resistant layer, semiconductor processing apparatus incorporating same, and method for forming same 1 2003
8017062 Semiconductor processing components and semiconductor processing utilizing same 0 2005
* 2006/0046,450 Semiconductor processing components and semiconductor processing utilizing same 5 2005
* 2008/0131,689 CERAMIC ARTICLE HAVING CORROSION-RESISTANT LAYER, SEMICONDUCTOR PROCESSING APPARATUS INCORPORATING SAME, AND METHOD FOR FORMING SAME 1 2008
 
TOKYO ELECTRON CO., LTD. (1)
* 2005/0147,852 Internal member for plasma-treating vessel and method of producing the same 2 2005
 
AIR PRODUCTS AND CHEMICALS, INC. (1)
7119032 Method to protect internal components of semiconductor processing equipment using layered superlattice materials 4 2004
 
EUGENE TECHNOLOGY CO., LTD. (1)
* 2010/0243,165 APPARATUS FOR SURFACE-TREATING WAFER USING HIGH-FREQUENCY INDUCTIVELY-COUPLED PLASMA 1 2007
 
APPLIED MATERIALS, INC. (42)
* 6568896 Transfer chamber with side wall port 8 2001
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* 2004/0033,385 Erosion-resistant components for plasma process chambers 11 2001
6942929 Process chamber having component with yttrium-aluminum coating 27 2002
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8067067 Clean, dense yttrium oxide coating protecting semiconductor processing apparatus 1 2004
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7479304 Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate 23 2004
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7696117 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas 19 2007
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8367227 Plasma-resistant ceramics with controlled electrical resistivity 7 2007
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8114525 Process chamber component having electroplated yttrium containing coating 0 2008
8016948 Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal 1 2008
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* 2012/0138,472 METHOD OF FORMING A PROCESS CHAMBER COMPONENT HAVING ELECTROPLATED YTTRIUM CONTAINING COATING 0 2012
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9034199 Ceramic article with reduced surface defect density and process for producing a ceramic article 2 2012
* 9394615 Plasma resistant ceramic coated conductive article 0 2012
* 2013/0284,373 PLASMA RESISTANT CERAMIC COATED CONDUCTIVE ARTICLE 12 2012
9212099 Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics 2 2013
9090046 Ceramic coated article and process for applying ceramic coating 3 2013
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9051219 Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide 0 2013
* 2014/0363,596 RARE-EARTH OXIDE BASED EROSION RESISTANT COATINGS FOR SEMICONDUCTOR APPLICATION 3 2013
* 2015/0270,108 RARE-EARTH OXIDE BASED EROSION RESISTANT COATINGS FOR SEMICONDUCTOR APPLICATION 3 2015
 
TOKYO ELECTRON LIMITED (57)
7297635 Processing method 12 2002
7204912 Method and apparatus for an improved bellows shield in a plasma processing system 11 2002
7166166 Method and apparatus for an improved baffle plate in a plasma processing system 17 2002
7166200 Method and apparatus for an improved upper electrode plate in a plasma processing system 26 2002
* 7147749 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 21 2002
* 7137353 Method and apparatus for an improved deposition shield in a plasma processing system 13 2002
* 2004/0060,656 Method and apparatus for an improved bellows shield in a plasma processing system 2 2002
* 2004/0061,447 Method and apparatus for an improved upper electrode plate in a plasma processing system 2 2002
* 2004/0060,657 Method and apparatus for an improved deposition shield in a plasma processing system 8 2002
* 2004/0060,661 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 5 2002
* 2003/0141,017 Plasma processing apparatus 11 2003
7846291 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film 4 2003
* 2004/0129,674 Method and system to enhance the removal of high-k dielectric materials 9 2003
* 2005/0098,106 Method and apparatus for improved electrode plate 5 2003
7780786 Internal member of a plasma processing vessel 5 2003
* 2004/0216,667 Internal member of a plasma processing vessel 32 2003
* 2004/0182,315 Reduced maintenance chemical oxide removal (COR) processing system 126 2003
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7560376 Method for adjoining adjacent coatings on a processing element 5 2004
7291566 Barrier layer for a processing element and a method of forming the same 11 2004
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7163585 Method and apparatus for an improved optical window deposition shield in a plasma processing system 25 2004
7552521 Method and apparatus for improved baffle plate 12 2004
7282112 Method and apparatus for an improved baffle plate in a plasma processing system 11 2004
* 2005/0103,268 Method and apparatus for an improved baffle plate in a plasma processing system 2 2004
7601242 Plasma processing system and baffle assembly for use in plasma processing system 7 2005
* 2005/0235,918 Substrate treating apparatus 0 2005
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* 2009/0194,233 Component for semicondutor processing apparatus and manufacturing method thereof 3 2006
8117986 Apparatus for an improved deposition shield in a plasma processing system 1 2006
* 2007/0028,839 Method and apparatus for an improved deposition shield in a plasma processing system 7 2006
7566379 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 2 2006
* 2007/0034,337 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system 9 2006
* 2007/0095,284 GAS TREATING DEVICE AND FILM FORMING DEVICE 6 2006
7566368 Method and apparatus for an improved upper electrode plate in a plasma processing system 6 2006
* 2007/0096,658 METHOD AND APPARATUS FOR AN IMPROVED UPPER ELECTRODE PLATE IN A PLASMA PROCESSING SYSTEM 9 2006
8118936 Method and apparatus for an improved baffle plate in a plasma processing system 1 2007
7811428 Method and apparatus for an improved optical window deposition shield in a plasma processing system 5 2007
7678226 Method and apparatus for an improved bellows shield in a plasma processing system 5 2007
* 2007/0125,494 METHOD AND APPARATUS FOR AN IMPROVED BELLOWS SHIELD IN A PLASMA PROCESSING SYSTEM 8 2007
8057600 Method and apparatus for an improved baffle plate in a plasma processing system 3 2007
* 2007/0204,794 METHOD AND APPARATUS FOR AN IMPROVED BAFFLE PLATE IN A PLASMA PROCESSING SYSTEM 7 2007
* 2008/0066,647 Internal member for plasma-treating vessel and method of producing the same 6 2007
7879179 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film 5 2007
* 2008/0069,966 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film 13 2007
* 2008/0070,032 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film 12 2007
8043971 Plasma processing apparatus, ring member and plasma processing method 4 2008
* 2009/0165,720 SUBSTRATE TREATING APPARATUS 0 2009
8409399 Reduced maintenance chemical oxide removal (COR) processing system 3 2009
* 2009/0226,633 Reduced Maintenance Chemical Oxide Removal (COR) Processing System 3 2009
8449715 Internal member of a plasma processing vessel 3 2010
* 2010/0307,687 INTERNAL MEMBER OF A PLASMA PROCESSING VESSEL 1 2010
* 8986495 Plasma processing apparatus 0 2010
* 2011/0132,542 PLASMA PROCESSING APPARATUS 5 2010
* 2012/0200,051 METHOD FOR COATING INTERNAL MEMBER HAVING HOLES IN VACUUM PROCESSING APPARATUS AND THE INTERNAL MEMBER HAVING HOLES COATED BY USING THE COATING METHOD 0 2012
8877002 Internal member of a plasma processing vessel 0 2013
 
COVALENT MATERIALS CORPORATION (1)
* 2005/0227,118 Plasma resistant member 13 2005
 
NGK INSULATORS, LTD. (3)
6783875 Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members 43 2001
* 7138192 Film of yttria-alumina complex oxide, a method of producing the same, a sprayed film, a corrosion resistant member, and a member effective for reducing particle generation 2 2003
* 2004/0067,392 Film of yttria-alumina complex oxide, a method of producing the same, a sprayed film, a corrosion resistant member, and a member effective for reducing particle generation 0 2003
* Cited By Examiner