| 7,297,635 Processing method
|
4 |
2002
|
| 7,204,912 Method and apparatus for an improved bellows shield in a plasma processing system
|
10 |
2002
|
| 7,166,166 Method and apparatus for an improved baffle plate in a plasma processing system
|
14 |
2002
|
| 7,166,200 Method and apparatus for an improved upper electrode plate in a plasma processing system
|
19 |
2002
|
| 7,147,749 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
|
16 |
2002
|
| 7,137,353 Method and apparatus for an improved deposition shield in a plasma processing system
|
10 |
2002
|
| 7,846,291 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
|
1 |
2003
|
| 7,780,786 Internal member of a plasma processing vessel
|
3 |
2003
|
| 7,560,376 Method for adjoining adjacent coatings on a processing element
|
4 |
2004
|
| 7,291,566 Barrier layer for a processing element and a method of forming the same
|
8 |
2004
|
| 7,163,585 Method and apparatus for an improved optical window deposition shield in a plasma processing system
|
18 |
2004
|
| 7,552,521 Method and apparatus for improved baffle plate
|
4 |
2004
|
| 7,282,112 Method and apparatus for an improved baffle plate in a plasma processing system
|
11 |
2004
|
| 7,601,242 Plasma processing system and baffle assembly for use in plasma processing system
|
5 |
2005
|
| 8,117,986 Apparatus for an improved deposition shield in a plasma processing system
|
0 |
2006
|
| 7,566,379 Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
|
1 |
2006
|
| 7,566,368 Method and apparatus for an improved upper electrode plate in a plasma processing system
|
5 |
2006
|
| 8,118,936 Method and apparatus for an improved baffle plate in a plasma processing system
|
0 |
2007
|
| 7,811,428 Method and apparatus for an improved optical window deposition shield in a plasma processing system
|
3 |
2007
|
| 7,678,226 Method and apparatus for an improved bellows shield in a plasma processing system
|
4 |
2007
|
| 8,057,600 Method and apparatus for an improved baffle plate in a plasma processing system
|
1 |
2007
|
| 7,879,179 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
|
3 |
2007
|
| 8,043,971 Plasma processing apparatus, ring member and plasma processing method
|
1 |
2008
|
| 8,409,399 Reduced maintenance chemical oxide removal (COR) processing system
|
0 |
2009
|
| 6,568,896 Transfer chamber with side wall port
|
5 |
2001
|
| 7,670,688 Erosion-resistant components for plasma process chambers
|
1 |
2001
|
| 6,942,929 Process chamber having component with yttrium-aluminum coating
|
11 |
2002
|
| 6,776,873 Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers
|
42 |
2002
|
| 7,371,467 Process chamber component having electroplated yttrium containing coating
|
3 |
2004
|
| 8,067,067 Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
|
0 |
2004
|
| 7,479,304 Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
|
6 |
2004
|
| 7,846,264 Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate
|
0 |
2006
|
| 7,696,117 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
|
3 |
2007
|
| 7,833,401 Electroplating an yttrium-containing coating on a chamber component
|
0 |
2007
|
| 8,367,227 Plasma-resistant ceramics with controlled electrical resistivity
|
0 |
2007
|
| 8,110,086 Method of manufacturing a process chamber component having yttrium-aluminum coating
|
0 |
2007
|
| 8,114,525 Process chamber component having electroplated yttrium containing coating
|
0 |
2008
|
| 8,016,948 Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
|
0 |
2008
|
| 8,034,734 Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus
|
1 |
2010
|
| 7,128,804 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
|
0 |
2000
|
| 7,311,797 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
|
20 |
2002
|
| 7,300,537 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
|
15 |
2004
|
| 7,611,640 Minimizing arcing in a plasma processing chamber
|
0 |
2006
|
| 7,605,086 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
|
0 |
2006
|
| 8,097,105 Extending lifetime of yttrium oxide as a plasma chamber material
|
0 |
2007
|
