METHOD TO LOCATE PARTICLES OF A PREDETERMINED SPECIES WITHIN A SOLID AND RESULTING STRUCTURES
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United States of America Patent
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May 20, 1998
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May 20, 1998
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Abstract
The present invention relates to a method to locate particles of a predetermined species within a solid, more specifically to form an oxy-nitride dielectric for VLSI applications. A layer (18) of a substance (YZ) is formed upon a solid (10) and a chemical reaction is performed between the substance (YZ) and a gas (X), thereby releasing particles (Z) of a predetermined species which incorporate into the solid (10). This method is used, for example, to form an oxy-nitride dielectric by incorporating nitrogen within a silicon oxide layer (28').
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