US Patent Application No: 2001/0003,480

Number of patents in Portfolio can not be more than 2000

Apertures and illuminating apparatus including aperture openings dimensioned to compensate for directional critical dimension differences

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Abstract

Apertures for use in an illuminating apparatus for forming patterns in a semiconductor wafer and illuminating apparatus including such apertures are provided. The aperture includes a shielding area and a non-circular transparent area within the shielding area. The transparent area has a ratio of a short axis to a long axis (R=short axis/long axis) that exceeds 0 and is smaller than 1 (0

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Patent Owner(s)

Patent OwnerAddressTotal Patents
SAMSUNG ELECTRONICS CO., LTD.SUWON-SI GYEONGGI-DO45244

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ryuk, Heung-jo Yongin, KR 3 14
Yoo, Ji-yong Suwon, KR 2 4

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
CARL ZEISS SMT GMBH (2)
7,751,127 Projection objective and method for optimizing a system aperture stop of a projection objective 1 2008
8,049,973 Projection objective and method for optimizing a system aperture stop of a projection objective 0 2010
 
DAI NIPPON PRINTING CO., LTD. (1)
8,259,290 Diffractive optical device, and aligner comprising that device 0 2007
 
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1)
7,667,821 Multi-focus scanning with a tilted mask or wafer 0 2005