Photo curable resin composition and photosensitive element

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6583198
APP PUB NO 20010003759A1
SERIAL NO

09198333

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Abstract

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A photo curable resin composition, which comprises (A) an acid-modified, vinyl group-containing epoxy resin, (B) an elastomer, (C) a photopolymerization initiator, (D) a diluent and (E) a curing agent, can gives a high performance cured film having distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics, and a photosensitive element, which comprises a support and a layer of the photo curable resin composition laid on the support, has distinguished heat resistance, humidity-heat resistance, adhesibility, mechanical characteristics and electrical characteristics.

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Patent Owner(s)

  • HITACHI CHEMICAL COMPANY, LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirakura, Hiroaki Ibaraki-ken, JP 7 53
Hirayama, Takao Ibaraki-ken, JP 13 95
Ito, Toshihiko Ibaraki-ken, JP 21 252
Sato, Kuniaki Ibaraki-ken, JP 50 518
Yoshino, Toshizumi Ibaraki-ken, JP 9 55

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