Polymer, resist composition and patterning process
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United States of America Patent
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Dec 10, 2002
Grant Date -
Jun 14, 2001
app pub date -
Dec 1, 2000
filing date -
Dec 1, 1999
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Abstract
A polymer bearing specific cyclic silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.
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