Radiation source for use in lithographic projection apparatus

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United States of America Patent

PATENT NO 6452194
SERIAL NO

09735641

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Abstract

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A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Y Helmond, NL 8 179
Bartnik, Andrzej Warszawa, PL 2 72
Bijkerk, Frederik Amsterdam, NL 27 265
de, Bruijn Cornelis C Sprundel, NL 2 72
Fiedorowicz, Henryk Warszawa, PL 2 72
Koshelev, Konstantin N Troitzk, RU 1 51

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