Optical system for crystallization tool

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United States of America Patent

PATENT NO 6542317
SERIAL NO

09746639

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides an optical system for crystallization tool for producing an crystallized silicon thin film by using an excimer laser as a light source to crystallize an amorphous silicon thin film through a fine stripped pattern, including 1st to 10th lenses sequentially arranged along an optical axis from said excimer laser, wherein the 1st lens having both side made convex; the 2nd lens having one side made convex toward the light source and the other side concave; the 3rd lens having one side made convex toward the light source and the other side concave; the 4th lens having both side concave; the 5th lens having both side made convex; the 6th lens having one side concave toward the light source and the other side made convex; the 7th lens having one side made convex toward the light source and the other side concave; the 8th lens having both side made convex; the 9th lens having one side made convex toward the light source and the other side concave; and the 10th lens having both side made convex.

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Patent Owner(s)

  • ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Sang Soo Taejon, KR 21 119
Chung, Hai Bin Taejon, KR 5 41
Kim, Dae Yong Taejon, KR 46 302
Kim, Doh Hoon Taejon, KR 4 41
Lee, Kag Hyeon Taejon, KR 4 41

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