Manufacturing method of semiconductor integrated circuit device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6607988
APP PUB NO 20010006245A1
SERIAL NO

09749554

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Abstract

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With a view to providing a technique for highly-selective etching of Ru (ruthenium) using a photoresist as an etching mask, an Ru-film, which is an lower electrode material deposited on the side walls and bottom surface of a hole, is covered with a photoresist film, followed by isotropic dry etching in a gas atmosphere containing an ozone gas, whereby a portion of the Ru film outside of the hole is removed.

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Patent Owner(s)

Patent OwnerAddress
PS4 LUXCO S A R L2121 LUXEMBOURG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Toshiyuki Machida, JP 47 608
Izawa, Masaru Hino, JP 101 574
Nakahara, Miwako Yokohama, JP 19 152
Nakamura, Yoshitaka Ome, JP 179 1219
Nojiri, Kazuo Higashimurayama, JP 40 544
Ohno, Shigeru Yokohama, JP 132 5431
Saeki, Tomonori Yokohama, JP 17 81
Tsunekawa, Sukeyoshi Iruma, JP 18 380
Yunogami, Takashi Niiza, JP 25 415

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