Manufacturing method of semiconductor integrated circuit device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6607988
APP PUB NO 20010006245A1
SERIAL NO

09749554

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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With a view to providing a technique for highly-selective etching of Ru (ruthenium) using a photoresist as an etching mask, an Ru-film, which is an lower electrode material deposited on the side walls and bottom surface of a hole, is covered with a photoresist film, followed by isotropic dry etching in a gas atmosphere containing an ozone gas, whereby a portion of the Ru film outside of the hole is removed.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
PS4 LUXCO S.A.R.L.LUXEMBOURG, LU167

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Toshiyuki Machida, JP 47 585
Izawa, Masaru Hino, JP 96 503
Nakahara, Miwako Yokohama, JP 19 144
Nakamura, Yoshitaka Ome, JP 174 1117
Nojiri, Kazuo Higashimurayama, JP 40 525
Ohno, Shigeru Yokohama, JP 132 5404
Saeki, Tomonori Yokohama, JP 17 73
Tsunekawa, Sukeyoshi Iruma, JP 18 374
Yunogami, Takashi Niiza, JP 25 400

Cited Art Landscape

Patent Info (Count) # Cites Year
 
HITACHI, LTD. (1)
* 6451665 Method of manufacturing a semiconductor integrated circuit 31 1999
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
Other [Check patent profile for assignment information] (1)
* 6435190 Autogenous cell patch cardio myoplasty and advanced muscle graft implantation system 3 2000
 
ROUND ROCK RESEARCH, LLC (8)
7524410 Methods and apparatus for removing conductive material from a microelectronic substrate 3 2004
7670466 Methods and apparatuses for electrochemical-mechanical polishing 10 2006
7588677 Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate 0 2006
7560017 Methods and apparatus for electrically detecting characteristics of a microelectronic substrate and/or polishing medium 0 2006
7604729 Methods and apparatus for selectively removing conductive material from a microelectronic substrate 2 2006
7618528 Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate 0 2006
7972485 Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate 0 2009
8101060 Methods and apparatuses for electrochemical-mechanical polishing 8 2010
 
PS4 LUXCO S.A.R.L. (2)
* 6753133 Method and manufacturing a semiconductor device having a ruthenium or a ruthenium oxide 8 2002
* 2002/0132,194 Method and manufacturing a semiconductor device having a ruthenium or a ruthenium oxide 0 2002
 
SOITEC (1)
* 8765571 Method of manufacturing a base substrate for a semi-conductor on insulator type substrate 1 2012
 
MICRON TECHNOLOGY, INC. (7)
7566391 Methods and systems for removing materials from microfeature workpieces with organic and/or non-aqueous electrolytic media 3 2004
* 7700436 Method for forming a microelectronic structure having a conductive material and a fill material with a hardness of 0.04 GPA or higher within an aperture 0 2006
* 2006/0199,351 Method and apparatus for removing adjacent conductive and non-conductive materials of a microelectronic substrate 8 2006
* 2009/0255,806 METHODS AND SYSTEMS FOR REMOVING MATERIALS FROM MICROFEATURE WORKPIECES WITH ORGANIC AND/OR NON-AQUEOUS ELECTROLYTIC MEDIA 0 2009
8048756 Method for removing metal layers formed outside an aperture of a BPSG layer utilizing multiple etching processes including electrochemical-mechanical polishing 0 2010
8603319 Methods and systems for removing materials from microfeature workpieces with organic and/or non-aqueous electrolytic media 0 2012
9214359 Method and apparatus for simultaneously removing multiple conductive materials from microelectronic substrates 0 2014
 
CHEIL INDUSTRIES INC. (6)
* 7632622 Antireflective hardmask composition and methods for using same 4 2005
* 2007/0003,863 Antireflective hardmask composition and methods for using same 9 2005
* 7405029 Antireflective hardmask composition and methods for using same 4 2006
* 7378217 Antireflective hardmask composition and methods for using same 8 2006
* 2007/0072,111 Antireflective hardmask composition and methods for using same 1 2006
* 2007/0059,635 Antireflective hardmask composition and methods for using same 4 2006
 
APPLIED MATERIALS, INC. (14)
7438949 Ruthenium containing layer deposition method 31 2005
* 2006/0165,892 Ruthenium containing layer deposition method 24 2005
* 2006/0162,658 Ruthenium layer deposition apparatus and method 11 2005
* 2007/0190,362 PATTERNED ELECTROLESS METALLIZATION PROCESSES FOR LARGE AREA ELECTRONICS 9 2006
* 2007/0243,452 RELIABLE FUEL CELL ELECTRODE DESIGN 5 2007
* 2007/0271,751 METHOD OF FORMING A RELIABLE ELECTROCHEMICAL CAPACITOR 5 2007
7888168 Solar cell contact formation process using a patterned etchant material 12 2008
* 2009/0142,880 Solar Cell Contact Formation Process Using A Patterned Etchant Material 16 2008
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8183081 Hybrid heterojunction solar cell fabrication using a metal layer mask 13 2009
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* 2010/0055,822 BACK CONTACT SOLAR CELLS USING PRINTED DIELECTRIC BARRIER 22 2009
* 2011/0104,850 SOLAR CELL CONTACT FORMATION PROCESS USING A PATTERNED ETCHANT MATERIAL 10 2011
8859324 Methods of manufacturing solar cell devices 1 2013
 
FUJITSU SEMICONDUCTOR LIMITED (3)
* 8093071 Semiconductor device and method of manufacturing the same 1 2009
* 2009/0298,204 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 0 2009
8349679 Semiconductor device and method of manufacturing the same 1 2011
 
HYNIX SEMICONDUCTOR INC. (2)
* 8288274 Method of forming noble metal layer using ozone reaction gas 0 2008
* 2009/0263,967 Method of forming noble metal layer using ozone reaction gas 2 2008
* Cited By Examiner