Method for fabricating a semiconductor capacitor
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United States of America Patent
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Jan 8, 2002
Grant Date -
Jul 19, 2001
app pub date -
Dec 10, 1998
filing date -
Dec 19, 1997
priority date (Note) -
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Abstract
A method for fabricating a capacitor electrode on a semiconductor substrate includes the steps of: forming a conducting layer over the semiconductor substrate; forming a photoresist layer over the conducting layer; pattering the photoresist layer through an interfering exposure step; and pattering the conducting layer using the patterned photoresist layer as a mask, thereby forming a capacitor electrode.
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