Resist film removing composition and method for manufacturing thin film circuit element using the composition
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 31, 2002
Grant Date -
Aug 16, 2001
app pub date -
Oct 21, 1998
filing date -
Oct 28, 1997
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A resist film removing composition used in the manufacture of a thin film circuit element having an organic insulation film which comprises 50 to 70% by weight of an alkanolamine having 3 or more carbon atoms, 20 to 30% by weight of a water-miscible solvent and 10 to 20% by weight of water. The resist film removing composition can easily remove a resist film remaining after etching, without swelling the organic insulation film.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully