Vertical low-pressure chemical vapor deposition furnace
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Sep 6, 2001
app pub date -
Nov 30, 2000
filing date -
Feb 15, 2000
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A vertical low-pressure chemical vapor deposition furnace. The furnace includes an outer quartz tube, a heating device and a gas injector. The heating device is installed on the exterior sidewalls of the outer quartz tube for heating the quartz tube. The gas injector includes an entrance section, a looping main body and an outlet section. The input section penetrates a hole on the lower sidewall of the outer quartz tube. The looping main body is positioned between the outer quartz tube and a quartz boat. One end of the looping main body is connected to the input section while the other end is connected to the output section. Reactive gases flowing into the input section is preheated in the looping main body before delivering into the reaction chamber.
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