Vapor deposition method of organic compound and refinement method of organic compound
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United States of America Patent
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Issued Date -
Sep 13, 2001
app pub date -
Mar 8, 2001
filing date -
Mar 9, 2000
priority date (Note) -
Abandoned
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Abstract
A vapor deposition method of an organic compound comprises introducing a mixture of an organic compound powder with a powder or crushed particles of at least one of a ceramic, a metal, and a metal coated with a ceramic in a receptacle; and heating the receptacle which contains the mixture, in a vacuum, so that the organic compound is sublimated or vaporized, and is deposited onto an object surface so as to form a thin organic compound layer thereon.
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