Charged particle beam system and pattern slant observing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 18, 2003
Grant Date -
Oct 4, 2001
app pub date -
Mar 26, 2001
filing date -
Mar 28, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A charged particle beam system comprising a charged beam source, a condenser lens, a scanning deflecting device, an objective lens and a secondary electron detector further comprises a slant observing deflecting device arranged between the objective lens and a sample. The slant observing deflecting device deflects charged particle beams immediately before the surface of the sample, to cause the charged particle beams to be slantingly incident on the sample. The deflection angle of the charged particle beams is controlled by a DC current component which is inputted to the slant observing deflecting device. The irradiation position shift of the charged particle beams due to the slant deflection is corrected and controlled by feeding an input value of the slant observing deflecting device and the slant angle of the charged particle beams back to the input value of the scanning deflecting device.
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