Ni-Fe alloy sputtering target for forming magnetic thin films, magnetic thin film, and method of manufacturing the Ni-Fe alloy sputtering target
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United States of America Patent
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Nov 26, 2002
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N/A
app pub date -
May 31, 2001
filing date -
May 20, 1998
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Abstract
An Ni--Fe alloy material suitable for forming a ferromagnetic Ni--Fe alloy thin film is provided. The magnetic thin film produces a small number of particles during sputtering, and excels in corrosion resistance and magnetic properties. A method of manufacturing an Ni--Fe alloy sputtering target used to make the thin film is also provided. In addition, an Ni--Fe alloy sputtering target for forming magnetic thin films is provided. The sputtering target is characterized in that it has: an oxygen content of 50 ppm or less; an S content of 10 ppm or less; a carbon content of 50 ppm or less, and a total content of metal impurities other than the alloy components of 50 ppm or less. Such an Ni--Fe alloy target can be produced by melting and alloying high-purity materials obtained by dissolving the raw materials in hydrochloric acid, and performing ion exchange, activated-charcoal treatment, and electrolytic refining.
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