Standard for a nanotopography unit, and a method for producing the standard

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United States of America Patent

APP PUB NO 20010041258A1
SERIAL NO

09819961

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Abstract

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A standard for calibrating and checking a nanotopography unit, includes a substrate and at least one structure which is deposited on the substrate. It has a lateral extent of 0.5 to 20 mm and a vertical extent of 5 to 500 nm and is bounded by edges which have a gradient of at most 1*10.sup.-3. There is also a method for producing the standard, with material being deposited on the substrate at an inhomogeneous deposition rate.

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Patent Owner(s)

Patent OwnerAddress
WACKER SILTRONIC GESELLSCHAFT FUR HALBLEITERMATERIALIEN AGJOHANNES-HESS-STRASSE 24 BURGHAUSEN 84489

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kumpe, Ralf Wedemark, DE 2 7
Passek, Friedrich Adlkofen, DE 7 70
Schauer, Reinhard Laufen, DE 22 359
Schmolke, Rudiger Burghausen, DE 9 76

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