Heat treatment apparatus and cleaning method of the same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Dec 27, 2001
app pub date -
Jun 20, 2001
filing date -
Jun 21, 2000
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An unnecessary film is removed by cleaning gas flowing in a treatment vessel 8 for depositing a film on an object W to be processed such as a semiconductor wafer. In this case, the cleaning gas is preheated and activated by the gas heating mechanism 52 and the cleaning gas flows in the treatment vessel 8 in this state. By doing this, an unnecessary film in the treatment vessel made of quartz is removed effectively without damaging the treatment vessel.
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