Composition and method for removing resist and etching residues using hydroxylazmmonium carboxylates
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United States of America Patent
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Aug 13, 2002
Grant Date -
Jan 31, 2002
app pub date -
Mar 3, 1998
filing date -
Mar 3, 1998
priority date (Note) -
Expired
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Abstract
A mixture of hydroxylamine partially neutralized with a weak carboxylic acid and an organic solvent such as an alkyl sulfoxide, a pyrrolidinone or a sulfone removes hardened photoresist and polymeric photoresist residues from a substrate with reduced metal corrosion.
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