Methods for the lithographic deposition of materials containing nanoparticles
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United States of America Patent
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Oct 1, 2002
Grant Date -
Feb 14, 2002
app pub date -
Jul 30, 2001
filing date -
Jul 28, 2000
priority date (Note) -
Expired
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Abstract
A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.
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