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Abstract

Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II ##STR00001## wherein R.sub.1 inter alia is C.sub.4-C.sub.9cycloalkanoyl, C.sub.3-C.sub.12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar.sub.1 is either C.sub.6-C.sub.20aryl or C.sub.6-C.sub.20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M.sub.1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR.sub.3, SR.sub.4 or NR.sub.5R.sub.6; or M.sub.1, when x is 3, is a trivalent group, optionally substituted; R.sub.3 is for example hydrogen or C.sub.1-C.sub.12alkyl; C.sub.2-C.sub.6alkyl which is for example substituted by --OH, --SH, --CN, C.sub.3-C.sub.6alkenoxy, or --OCH.sub.2CH.sub.2CN; R.sub.4 is for example hydrogen, C.sub.1-C.sub.12alkyl, C.sub.3-C.sub.12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R.sub.5 and R.sub.6 independently of each other inter alia are hydrogen, C.sub.1-C.sub.12alkyl, C.sub.2-C.sub.4hydroxyalkyl, C.sub.2-C.sub.10alkoxyalkyl, C.sub.3-C.sub.5alkenyl, C.sub.3-C.sub.8cycloalkyl, phenyl-C.sub.1-C.sub.3alkyl, C.sub.1-C.sub.4alkanoyl, C.sub.3-C.sub.6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.

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