X-ray mask, method of manufacturing the same, and X-ray exposure method
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United States of America Patent
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Apr 2, 2002
Grant Date -
Mar 7, 2002
app pub date -
Jun 22, 1999
filing date -
Jun 23, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In an X-ray exposure method of this invention, an X-ray mask unit in which a patterned X-ray absorber is formed on a membrane is supported. This patterned X-ray absorber contains one of an element having a density/atomic weight of 0.085 [g/cm.sup.3 ] or more and an L-shell absorption edge at a wavelength of 0.75 to 1.6 nm and an element having a density/atomic weight of 0.04 [g/cm.sup.3 ] or more and an M-shell absorption edge at a wavelength of 0.75 to 1.6 nm. Synchrotron radiation having maximum light intensity at a wavelength of 0.6 to 1 nm is applied onto the X-ray mask unit. This improves the exposure accuracy in X-ray exposure.
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