Navigation method and device for pattern observation of semiconductor device
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United States of America Patent
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N/A
Issued Date -
Mar 21, 2002
app pub date -
Jul 12, 2001
filing date -
Jul 14, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Low magnification factor pattern image data D1 including the center of the observational position is acquired by adjusting an observation position using a pattern observation device 3 so that the center of observation of prescribed locations of a pattern enter the observational field of view at a low magnification factor. Data D4 for an offset amount caused by errors for the stage 2 is obtained by comparing the edge line segment data D2 based on low magnification factor pattern image data D1 to corresponding CAD line segment data D3. The stage 2 is moved relatively to compensate the offset amount to align the observational field of view of the pattern observation device 3 precisely at the specified pattern portion.
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