High quality lithographic processing
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Apr 18, 2002
app pub date -
Jul 2, 2001
filing date -
Jul 5, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Lithographic processes utilized for fabrication of micro-machines have been heretofore been plagued by stitching errors and errors arising from the roughness of the surface of the photosensitve material. These errors can be minimized by the utilization of multi-pass exposure techniques to minimize the stitching errors. The surface roughness errors are minimized by a thermal treatment of the surface of the photosensitive material that leaves the bulk of the photosensitve material undisturbed.
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