Semiconductor assisted metal deposition for nanolithography applications
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United States of America Patent
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Jun 25, 2002
Grant Date -
Apr 25, 2002
app pub date -
May 16, 2001
filing date -
Nov 25, 1998
priority date (Note) -
Expired
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Abstract
An article of manufacture and method of forming nanoparticle sized material components. A semiconductor oxide substrate includes nanoparticles of semiconductor oxide. A modifier is deposited onto the nanoparticles, and a source of metal ions are deposited in association with the semiconductor and the modifier, the modifier enabling electronic hole scavenging and chelation of the metal ions. The metal ions and modifier are illuminated to cause reduction of the metal ions to metal onto the semiconductor nanoparticles.
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