Chemical vapor deposition method and related material

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United States of America Patent

APP PUB NO 20020055001A1
SERIAL NO

09943459

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Abstract

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A process for chemical vapor deposition includes depositing a film using a metal .beta.-diketonate complex and an .alpha., .beta.-unsaturated alcohol. The metal .beta.-diketonate complex and the .alpha., .beta.-unsaturated alcohol is contacted on the substrate at the same time, at different times or alternately.

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Patent Owner(s)

Patent OwnerAddress
TRI CHEMICAL LABORATORY INCSAKURADAI 4002 NAKATSU AIKAWA-MACHI JAPAN AIKOH-GUN KANAGAWA 243-03

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Funakubo, Hiroshi Kawasaki-shi, JP 46 471
Machida, Hideaki Kitatsurugun, JP 31 109
Murakami, Yasushi Nagano-ken, JP 60 1479

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