Volatile organometallic complexes of lowered reactivity suitable for use in chemical vapor deposition of metal oxide films
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United States of America Patent
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Jul 9, 2002
Grant Date -
Jun 13, 2002
app pub date -
Dec 7, 2000
filing date -
Dec 7, 2000
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Abstract
Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.
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