Protection of semiconductor fabrication and similar sensitive processes
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United States of America Patent
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N/A
Issued Date -
Jul 11, 2002
app pub date -
Oct 1, 2001
filing date -
Feb 28, 1997
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A detection system for detecting base contamination at low concentrations in gas, for instance to protect a sensitive process, characterized in that the detection system is constructed to examine multiple amines in gas to produce a reading stoichiometrically related to the proton bonding characteristic of the multiple amines present, the detection system comprising at least two channels through which a gas to be examined passes, an amines remover located in one of the channels, at least one thermal/catalytic converter which discharges NO for each channel, and at least one chemiluminescent NO detector, whereby the total amine concentration is determined from the difference between the detected signals for the channels.
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