Lithographic plate having conformal overcoat and photosensitive layer on a rough substrate
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United States of America Patent
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Dec 17, 2002
Issued Date -
N/A
app pub date -
Jan 15, 2002
filing date -
Oct 30, 2000
priority date (Note) -
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Abstract
The present invention provides a lithographic printing plate comprising on a roughened substrate a substantially conformal photosensitive layer and a substantially conformal overcoat. The photosensitive layer is substantially conformally coated on the roughened substrate surface and the overcoat is substantially conformally coated on the photosensitive layer surface so that the surface of the overcoat has peaks and valleys substantially corresponding to the major peaks and valleys of the substrate microscopic surface. The lithographic plate of such a configuration can provide no or low tackiness and excellent block resistance, while allowing excellent press durability. For on-press developable lithographic plate, such a plate configuration also allows excellent on-press developability.
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