Method and apparatus for microlithography
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United States of America Patent
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Sep 23, 2003
Grant Date -
Aug 8, 2002
app pub date -
Jan 18, 2001
filing date -
Jan 18, 2001
priority date (Note) -
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Abstract
The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle. The invention also relates to a method for patterning a work piece sensitive to electromagnetic radiation.
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