Optical multilayer structure material and process for producing the same, light switching device, and image display apparatus
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United States of America Patent
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N/A
Issued Date -
Sep 12, 2002
app pub date -
Jan 8, 2002
filing date -
Jan 10, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An optical multilayer structure material has a structure such that, on a substrate, a conductive layer in contact with the substrate, a gap portion having a size that enables an interference phenomenon to occur and can be changed, and an optical thin film are formed in this order. The circumference of a movable portion in the optical thin film is uniformly supported by supporting portions, suppressing generation of strain due to an internal stress. Through holes are formed in the movable portion to allow an etchant to easily reach a sacrifice layer when forming a gap portion by etching for sacrifice layer. There is provided an optical multilayer structure material having a simple construction, which can suppress generation of strain due to an internal stress and can be advantageously used in an image display apparatus.
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