Method and depositing a layer

United States of America Patent

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Dec 14, 2004
Grant Date
Sep 19, 2002
app pub date
Apr 12, 2000
filing date
Apr 20, 1999

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Abstract

This invention relates to a method of depositing a layer on an exposed surface of an insulating layer of material. The method includes treating the exposed surface with hydrogen or a gaseous source of hydrogen in the presence of a plasma, prior to or during deposition of a metallic layer.

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Patent Owner(s)

AVIZA TECHNOLOGY LIMITED;SPTS TECHNOLOGIES LIMITED

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Beekman, Knut	Yatton, GB	9	160
Rich, Paul	Gloucestershire, GB	19	73
Wiggins, Claire Louise	Cheltenham, GB	5	50

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Method and depositing a layer

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09548014

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PATENT NO	6831010
APP PUB NO	20020132460A1
SERIAL NO	09548014
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 14, 2004	US,6831010,B2 US6831010B2	GRANTED PATENT AS SECOND PUBLICATION
September 19, 2002	US,20020132460,A1 US20020132460A1	FIRST PUBLISHED PATENT APPLICATION

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09548014

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