Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices
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United States of America Patent
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Jun 17, 2003
Grant Date -
Oct 3, 2002
app pub date -
Mar 28, 2001
filing date -
Mar 28, 2001
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Improved nozzle design that discharges more powerful, more focused fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which an array of more forceful, more focused process streams are desired for treating microelectronic workpieces. The present invention is particularly useful to cryogenically clean microelectronic workpieces, where the improvements allow the conventionally more troublesome smaller contaminant particles to be cleaningly removed with greater particle removal efficiency.
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