Deposition apparatus and deposition method
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United States of America Patent
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Issued Date -
Oct 3, 2002
app pub date -
Jan 31, 2002
filing date -
Feb 1, 2001
priority date (Note) -
Abandoned
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Abstract
A deposition apparatus is provided for manufacturing an organic compound layer having a plurality of function regions. The deposition apparatus includes a plurality of evaporation sources within a deposition chamber, for enabling continuous formation of respective function regions comprised of organic compounds and, further, formation of a mixed region at an interface between adjacent ones of the function regions. With the deposition apparatus having such fabrication chamber, it is possible to prevent impurity contamination between the functions regions and further possible to form an organic compound layer with an energy gap relaxed at the interface.
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