Inter-spinous process implant and method with deformable spacer
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United States of America Patent
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N/A
Issued Date -
Oct 3, 2002
app pub date -
Nov 9, 2001
filing date -
Oct 20, 1998
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention is a interspinous process device which maybe placed between adjacent spinous processes to limit the movement of the vertebrae. The device limits the range of motion of the spinous processes. The various embodiments include spacers which have a compressible medium that preferably provides progressive resistance.
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