System and method for correcting design rule violations in a mask layout file
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United States of America Patent
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-
N/A
Issued Date -
Oct 3, 2002
app pub date -
May 31, 2002
filing date -
Sep 22, 1999
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A system and method for correcting design rule violations in a mask layout file are disclosed. The method includes comparing a feature dimension in a mask layout file with a design rule in a technology file. If the feature dimension is less than the design rule, a design rule violation is identified and automatically corrected in the mask layout file.
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Family
International Classification(s)
Cited Art Landscape
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