Lithographically patterning of UV cure elastomer thin films
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United States of America Patent
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Issued Date -
Oct 17, 2002
app pub date -
Apr 11, 2001
filing date -
Apr 11, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Elastomer thin films can be lithographically patterned by using an UV curable polydimethylsiloxane, rather than replica molding of thermal cure elastomers. The fabrication method of such patterned elastomers consists of elastomer formulation, substrate modification, spinning elastomer, pattern development, and possible a backside etch of the substrate.
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