High resolution maskless lithography field lens for telecentric system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Oct 31, 2002
app pub date -
Apr 2, 2002
filing date -
Apr 30, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A system for performing digital lithography onto a subject is provided. The system includes a telecentric lens system that utilizes a field lens for redirecting light without distortion. The field lens may be utilized with a microlens array, a grating, and other lenses to achieve a desired result. A Fresnel lens may be used in place of the field lens and may be combined with the microlens array into a diffraction optical element.
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